HackerFab Contributor · TU Munich

We Build
Our Own
Fab Tools.

Maskless lithography writers, thermal evaporators, plasma etchers — all student-built from scratch. We make chip fabrication accessible, one DIY machine at a time.

~2 µm
Feature Size
€3 200
Machine BOM
100%
Open Source
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WHO WE ARE

Build the Fab, Not Just the Chip

We are a HackerFab affiliate at TU Munich — a student group that builds semiconductor fabrication equipment from scratch and uses it to actually process wafers. No cleanroom required.

Why Now

60 / 90%
Taiwan dependency

60% of global chips, 90% of advanced nodes produced on one island — a single geopolitical shock could halt the entire industry.

7% → 20%
EU Chips Act target

Europe wants to raise its global chip market share from 7% to 20% by 2030. €43B committed. €638M earmarked for Germany alone.

65 000
Talent gap in Europe

The semiconductor industry needs 65,000 more engineers across Europe — but universities have no hands-on fabrication training.

Yet universities teach chip design in simulation only. Nobody gives students access to actual fab equipment. We think that's wrong — and we're fixing it. Think of us as the “3D printer moment” for silicon: a low-cost, open-source fab in every engineering faculty.

Lithography

We build maskless UV lithography writers using DMD spatial light modulators, achieving ~2 µm feature sizes on photoresist-coated wafers.

405nm UVDMD/SLMXY StageOpenCV

Thin Film Deposition

DIY thermal evaporators and sputtering systems for depositing metals (Al, Au, Cr) and dielectrics. Vacuum down to 10⁻⁶ mbar.

Thermal Evap.SputteringTurbopumpPID Control

Etching & Processing

Wet bench for HF/KOH etching and spin coating, plus a DIY RIE plasma etcher for anisotropic silicon patterning.

RIE PlasmaKOH Wet EtchSpin CoaterPhotoresist

Characterisation

Optical profilometry, four-point probe sheet resistance, SEM access via university partners, and custom electrical test benches.

Profilometer4-Point ProbeSEMPython

Contributing to the HackerFab Network

HackerFab is a global movement to democratize semiconductor fabrication. We contribute our machine designs, firmware, and process recipes openly — so anyone can replicate our tools and build their own micro-fab lab.

~2 µm
Feature Size
€3 200
Machine BOM
100%
Open Source
WHAT WE BUILD

The Machines

Every tool is student-designed, student-built. Full schematics, firmware, and build logs on GitHub.

01
Operational

LithoWriter v2

Maskless UV Lithography System

A student-built maskless lithography system based on a 405nm UV LED, Texas Instruments DLP2000 DMD chip, and a 20× objective. Controlled via Python + Raspberry Pi. Achieves ~2 µm minimum feature size on S1813 photoresist.

~2 µm
Min. Feature Size
DLP2000 DMD405nm UVOpenCVRaspberry Pi
02
Operational

ThermoEvap-1

DIY Thermal Evaporator

A benchtop thermal evaporation system built from a repurposed diffusion pump and custom tungsten boat heater. Reaches 10⁻⁵ mbar for clean Al and Cr deposition on patterned wafers.

10⁻⁵ mbar
Base Pressure
TurbopumpW Boat HeaterPID ControlArduino
03
In Progress

MicroRIE

Reactive Ion Etcher (DIY)

A compact RF plasma etcher for anisotropic silicon and SiO₂ etching. Uses a 13.56 MHz RF generator, matching network, and SF₆/O₂ chemistry. Targeting vertical etch profiles for MEMS structures.

13.56 MHz
RF Frequency
13.56 MHz RFSF₆/O₂Matching NetworkLabVIEW
ROADMAP & PROCESS FLOW

Our 2026 Plan

Quarterly milestones, documented publicly. We publish everything — including failures.

Milestones

March 2026Complete

Kick-off

Workspace at TU Munich confirmed. Team founded. Ordering first components for Litho Stepper V2.1.

Mar – Jun 2026In Progress

Litho Stepper V2.1

Build and characterise the V2.1 stepper: 2 µm resolution, 5 µm alignment accuracy via interferometry, 10×10 mm write field. Grow team to 8 people. Document every step — BOM, SOP, failures included.

2 µm feature size5 µm alignment (interferometry)10×10 mm write field<30 total partsBOM under €3 200Grow to 8 team members
Jul – Sep 2026Planned

Spin Coater + Probe Station

DIY spin coater for photoresist application and a probe station for electrical characterisation of fabricated structures.

Uniform resist coatingI-V curve measurementProcess yield tracking
Sep 2026+Planned

Etching Tool

Reactive ion etcher (RIE) or wet bench for silicon and oxide etching — completing the full NMOS transistor fabrication flow.

SF₆/O₂ plasma etchingAnisotropic profilesFirst TUM-built transistor

Fab Process Flow

01
Wafer Prep
RCA clean, piranha etch, thermal oxidation at 1100°C
02
Spin Coat
S1813 photoresist @ 4000 rpm, 30s → 1.3 µm film
03
Soft Bake
115°C hotplate, 60s — drives off solvent
04
UV Expose
LithoWriter v2, 405nm, ~100 mJ/cm²
05
Develop
MF-319 developer, 60s, DI water rinse
06
Etch / Deposit
HF wet etch or Al thermal evaporation + lift-off

Lab Equipment

Lithography
LithoWriter v2 (DIY)
Deposition
ThermoEvap-1 (DIY)
Etching
Wet bench + MicroRIE (WIP)
Spin Coat
DIY spin coater
Measure
Profilometer, 4PP
Software
Python, KLayout, FreeCAD
CURRENT TEAM

The Team

We're actively growing — check out the application if you want to join.

Marvin Bullinger

Marvin Bullinger

EE

Lithography systems, optical design, electronics

Vincent Valente

Vincent Valente

EE

Process engineering, vacuum systems, characterisation

WE'RE RECRUITING

Build the Future of
DIY Chip Fabrication

We're two founders looking for passionate engineers who want to get their hands dirty — literally. No experience in lithography needed. Just curiosity, drive, and a love of making things.

Mechanical Engineer

Design and build the physical systems — stages, frames, vacuum chambers. CAD + hands-on fabrication.

FreeCAD / SolidWorksMachiningVacuum Systems

Electrical / Firmware

Motor control, sensor readout, custom PCBs. Bridge between hardware and the control software.

STM32 / ArduinoKiCadPython / C++

Process Engineer

Develop and document the photolithography process — spin coating, exposure doses, wet chemistry.

PhotoresistWet BenchCharacterisation

Software / CV

Pattern generation, image alignment, machine control software and the lithography exposure engine.

PythonOpenCVRaspberry Pi

What you get

We're small, focused, and move fast. Every person matters.

  • Access to real fabrication equipment
  • Hands-on work from day one — no busywork
  • Learn photolithography, vacuum tech, and process engineering
  • Open-source everything you build
  • Contribute to the global HackerFab network
  • Work alongside two highly motivated founders
ACTIVELY RECRUITING

Ready to build
your own fab?

Drop us a message — tell us who you are, what you've built before, and what excites you about semiconductor fabrication.

No formal application — just send an email.

GET IN TOUCH

Ready to Build Your Own Fab?

Want to join the team, replicate one of our machines, or collaborate on process development? All builds are fully open — reach out or just clone the repo and start building.

Location
TU Munich, EI Building, Campus Garching